Oxford PECVD Plasma Lab 100
Offers a wide range of material deposition, including: SiO2 from Silane or TEOS, Polysilicon, Amorphous silicon, Si3N4, SiC, P and B doping, Si Nanowires
Photos by Yoav Dudkevitch
Oxford | Site
Edmond J. Safra (Givat-Ram)
Nano Center
Contacts
- Itzhak Shweky
- itzhak.shweky@mail.huji.ac.il